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Summary:PURPOSE:To perform uniform sputtering by forming a titled device in such a way that the inside wall of a pipe to be treated is exposed to the inside of a vacuum vessel, disposing a target of a cylindrical shape at the central axis of the pipe to be treated, and providing an etching gun which turns around the central axis in accordance with the inside wall of the pipe to be treated. CONSTITUTION:Vacuum covers 2, 3 of a bottomed cylindrical shape are tightly fitted and fixed to both ends of a pipe 1 to be treated to form a vacuum vessel, and a target 5 of a cylindrical shape is inserted and fixed to the position of the central axis of the pipe 1 from the outer side in the end part of the cover 3. Further, an etching gun 15 which is freely rotatable along the inner side of the pipe is provided near the inner side of the pipe 1. First, the air in the vacuum vessel is evacuated through an evacuating port 4, and discs 9, 10 and a support 13 are rotated with gears 10, 12 by a revolution introducing shaft 11 which is driven by external driving power. According to the revolution thereof, the gun 15 rotates along the inside wall surface of the pipe 1 and etches the surface.
Bibliography:Application Number: JP19820018236