FIELD-EFFECT TYPE SEMICONDUCTOR DEVICE

PURPOSE:To increase the breaking withstand voltage for the titled semiconductor device by a method wherein a high density layer is formed under the source and drain electrode located on the area excluding an active layer, or an insulating film is interposed between the source and drain electrode and...

Full description

Saved in:
Bibliographic Details
Main Author NEMOTO YASUO
Format Patent
LanguageEnglish
Published 09.07.1983
Subjects
Online AccessGet full text

Cover

Loading…