METHOD FOR FIXING NEGATIVE TYPE LITHOGRAPHIC PLATE REQUIRING NO DAMPENING WATER

• Main Authors: KOBASHI SADAO, TSUDA MIKIO, FUJITA TAKASHI
• Format: Patent
• Language: English
• Published: 16.12.1982
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS

PURPOSE:To obtain a lithographic plate enhanced in resistance to solvents, etc., and printing, by fixing a photosensitive layer through a alkaline processing, after exposing and developing a raw lithographic plate prepared by forming a photosensitive layer containing an o-quinone-diazide compound and silicone rubber on a support. CONSTITUTION:A solution of naphthoquinone-1,2-diazide-5-sulfonate, or the like is coated on a support of a metal, such as Al or Cr, or a polyethylene terephthalate film or the like, and dried to form a photo-sensitive layer. A solution of gamma-aminopropyltriethoxysilane or the like is coated on the photosensitive layer, and on this layer a silicone rubber layer is formed to make a litiographic raw plate requiring no dampening water. After this raw plate has been exposed to the light image of a negative original using a light source rich in UV rays, it is fixed with a gaseous amine compound, an amine solution, an alkaline metal salt solution, or the like in a gaseous or liquid phase, thus permitting the silicone rubber layer not to peel from the unexposed photosensitive layer, and a lithographic plate excellent in resistances to solvents, printing, etc. to be obtained.