LITHOGRAPHIC PLATE

PURPOSE:To obtain a lithographic plate high in printing resistance and printing precision, by using as an imaging part a high-stability hydrophobic film consisting of a silanol olygomer containing fluoroalkyl chains and an organic high polymer. CONSTITUTION:A silanol olygomer represented by the show...

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Bibliographic Details
Main Authors TANNO SEIKICHI, IWASAKI KISHIROU, NAKANO FUMIO
Format Patent
LanguageEnglish
Published 29.10.1982
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Summary:PURPOSE:To obtain a lithographic plate high in printing resistance and printing precision, by using as an imaging part a high-stability hydrophobic film consisting of a silanol olygomer containing fluoroalkyl chains and an organic high polymer. CONSTITUTION:A silanol olygomer represented by the shown general formula in which Rf is fluoroalkyl, and X, Y are methyl, ethyl, methoxy, or ethoxy, and a polymer capable of being formed into a film at low temperature and high in heat stability, such as aromatic polyamide or aliphatic polyamide, or a polymer capable of being perfectly heat decomposed at low temperature and volatilized are mixed. A hydrophobic film of this mixture is formed on all the hydrophilic surface of a zinc or the like plate, and irradiated through a photomask with high energy rays to convert only the irradiated parts into a hydrophobic film, or said film brought into close contact with the mask pattern is converted into a hydrophilic film only in the parts except the image lines by plasma irradiation.
Bibliography:Application Number: JP19810059808