METHOD OF PREPARING EPOXIDATION CATALYST

PURPOSE:Inorganic silicon oxide with SiO2 content more than 50% and a fixed specific surface area is treated in the atmosphere or inert gas stream at 200 - 900 deg.C to obtain a catalyst by which hydroperoxide conversion rate, etc. in epoxidation can be improved.

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Bibliographic Details
Main Authors KATOU SHINICHI, NAKAMURA YOSHIHIKO, OOTAKI YASUHIKO, TORIUMI KINUKO, OGAWA TAKESHI, HIRAOKA MICHIO
Format Patent
LanguageEnglish
Published 11.05.1977
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Summary:PURPOSE:Inorganic silicon oxide with SiO2 content more than 50% and a fixed specific surface area is treated in the atmosphere or inert gas stream at 200 - 900 deg.C to obtain a catalyst by which hydroperoxide conversion rate, etc. in epoxidation can be improved.
Bibliography:Application Number: JP19750133479