METHOD OF PREPARING EPOXIDATION CATALYST
PURPOSE:Inorganic silicon oxide with SiO2 content more than 50% and a fixed specific surface area is treated in the atmosphere or inert gas stream at 200 - 900 deg.C to obtain a catalyst by which hydroperoxide conversion rate, etc. in epoxidation can be improved.
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Main Authors | , , , , , |
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Format | Patent |
Language | English |
Published |
11.05.1977
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Subjects | |
Online Access | Get full text |
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Summary: | PURPOSE:Inorganic silicon oxide with SiO2 content more than 50% and a fixed specific surface area is treated in the atmosphere or inert gas stream at 200 - 900 deg.C to obtain a catalyst by which hydroperoxide conversion rate, etc. in epoxidation can be improved. |
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Bibliography: | Application Number: JP19750133479 |