ELECTROLESS METAL PLATING METHOD
PROBLEM TO BE SOLVED: To provide a method for selectively applying electroless plating of metal, particularly gold and copper on a substrate such as a circuited substrate. SOLUTION: This method contains a stage in which the surface of a substrate 12 is applied with a dielectric permanent plating res...
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Main Authors | , , , |
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Format | Patent |
Language | English |
Published |
16.11.1999
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Edition | 6 |
Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a method for selectively applying electroless plating of metal, particularly gold and copper on a substrate such as a circuited substrate. SOLUTION: This method contains a stage in which the surface of a substrate 12 is applied with a dielectric permanent plating resist 16 contg. about 10 to 80% phenoxypolyol resin of about 40,000 to 130,000 molecular weight which is a condensate of epichloro-hydrin and bisphenol A, about 20 to 90% epoxidated multifunctional bisphenol A-formaldehyde-novolak resin of about 4,000 to 10,000 molecular weight, about 35 to 50% diglycidyl-ether of bisphenol A of about 600 to 2,500 and a cationic photoinitiator and capable of photoimaging by curing, a stage in which the permanent plating resist 16 is photopatterned, and the opening 18 exposing the region of the substrate 12 is formed therein and a stage in which the exposed region of the substrate 12 is applied with electroless plating of metal. |
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Bibliography: | Application Number: JP19990034874 |