REMOVING AGENT COMPOSITION

• Main Authors: KASHIHARA EIJI, NAGOSHI EIJI, SHIROTA MASAMI, KITAZAWA KOZO
• Format: Patent
• Language: English
• Published: 09.11.1999
• Edition: 6
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To provide a removing agent compsn. for resist which has not only excellent workability and safety but which can easily remove a resist in a short time even when the resist is hardened or chemically modified by high energy treatment. SOLUTION: This compsn. used for a resist contains (A) one or more kinds of compds. having 17 to 300 mol.wt. selected from quaternary ammonium salts and acids expressed by the formula, (B) a nonionic surfactant having 301 to 50000 mol.wt., and (C) water. In the formula, R , R , R , R are independently 1-10C hydrocarbon groups or hydroxyalkyl groups, and X<-> is an anion.