REMOVING AGENT COMPOSITION

PROBLEM TO BE SOLVED: To provide a removing agent compsn. for resist which has not only excellent workability and safety but which can easily remove a resist in a short time even when the resist is hardened or chemically modified by high energy treatment. SOLUTION: This compsn. used for a resist con...

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Bibliographic Details
Main Authors KASHIHARA EIJI, NAGOSHI EIJI, SHIROTA MASAMI, KITAZAWA KOZO
Format Patent
LanguageEnglish
Published 09.11.1999
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a removing agent compsn. for resist which has not only excellent workability and safety but which can easily remove a resist in a short time even when the resist is hardened or chemically modified by high energy treatment. SOLUTION: This compsn. used for a resist contains (A) one or more kinds of compds. having 17 to 300 mol.wt. selected from quaternary ammonium salts and acids expressed by the formula, (B) a nonionic surfactant having 301 to 50000 mol.wt., and (C) water. In the formula, R , R , R , R are independently 1-10C hydrocarbon groups or hydroxyalkyl groups, and X<-> is an anion.
Bibliography:Application Number: JP19980186617