APPARATUS FOR ETCHING INSIDE WALL OF CYLINDRICAL GLASS

• Main Author: MITAKE TAKAYOSHI
• Format: Patent
• Language: English
• Published: 27.07.1999
• Edition: 6
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS; CHEMISTRY; DEVICES USING STIMULATED EMISSION; ELECTRICITY; GLASS; GYROSCOPIC INSTRUMENTS; JOINING GLASS TO GLASS OR OTHER MATERIALS; MEASURING; MEASURING DISTANCES, LEVELS OR BEARINGS; METALLURGY; MINERAL OR SLAG WOOL; NAVIGATION; PHOTOGRAMMETRY OR VIDEOGRAMMETRY; PHYSICS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS; SURFACE TREATMENT OF GLASS; SURVEYING; TESTING

PROBLEM TO BE SOLVED: To provide an apparatus for efficiently and stably clearing the inside walls of cylindrical holes of a glass body, such as for RLG block. SOLUTION: The RLG block 10 consists of a glass body. The cylindrical holes 11a, 11b, 11c which are not-go holes are formed by an ultrasonic drill and the surfaces are like frosted glass. An etching head 3 having flocks on its outer periphery is coaxially inserted into the cylindrical hole 11a and an etchant is ejected into the cylindrical hole 11a from an ejection port 3b via a liquid feed pipe 2 and an etchant flow passage 3a by a fixed quantity liquid feed pump 1. The RLG block 10 is rotated by a revolving shaft 13. Since the flocks of the etching head 3 rub the inside wall of the cylindrical hole 11a, the inside wall thereof is efficiently and stably cleared. The etchant sagging from the cylindrical hole 11a accumulates in a tray 9 and is returned to the fixed quantity liquid feed pump 1 via a recirculation pipe 4 and is recycled.