BISSULFONATE COMPOUND

PROBLEM TO BE SOLVED: To obtain the subject new compound useful as a monomer for production of a polymer containing phenylene group which has excellent heat resistance, low-dielectric property and processability and is soluble in organic solvents. SOLUTION: This compound is represented by formula I...

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Bibliographic Details
Main Authors TAKAHASHI MASAYUKI, AKIIKE TOSHIYUKI, GOTO KOHEI, SHIBA TADAHIRO
Format Patent
LanguageEnglish
Published 27.04.1999
Edition6
Subjects
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Summary:PROBLEM TO BE SOLVED: To obtain the subject new compound useful as a monomer for production of a polymer containing phenylene group which has excellent heat resistance, low-dielectric property and processability and is soluble in organic solvents. SOLUTION: This compound is represented by formula I [R and R are each a 1-3C alkyl, fluoroalkyl or the like; R to R are each H, F or the like; R is an aryl represented by formula II (R is H, F or the like) or a 1-3C fluoroalkyl; R is H, F or the like; m is 1-5] e.g. bis(4-methylsulfonyloxyphenyl) diphenylmethane. The compound represented by formula I is obtained by a process comprising: dripping a sulfonyl chloride(anhydride) such as methanesulfonyl chloride into a pyridine solution of a bisphenol compound such as bis(4-hydroxyphenyl)diphenylmethane, while keeping the temperature at <=15 deg.C for 5-60 min in a nitrogen flow, agitating for 0-60 min, returning the temperature to room temperature and further agitating for 0-24 h, then reprecipitating the resultant suspension in 3-20 wt. times of ice water followed by recrystallization.
Bibliography:Application Number: JP19970283452