ROBOT HAND FOR THIN SUBSTRATE CARRYING ROBOT

PROBLEM TO BE SOLVED: To support wafers to eliminate damages and dust deposition. SOLUTION: A hand has a hand part 30 to support a wafer W at part of the outer end and a hand support 40 to mount the hand part thereon. The hand part 30 is formed with two arms 31, 31 having two stepped recesses 32 for...

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Bibliographic Details
Main Authors IMAI RYOICHI, INUKAI YASUHIRO
Format Patent
LanguageEnglish
Published 27.04.1999
Edition6
Subjects
BASIC ELECTRIC ELEMENTS
CHAMBERS PROVIDED WITH MANIPULATION DEVICES
CONVEYING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
HAND TOOLS
HANDLING THIN OR FILAMENTARY MATERIAL
MANIPULATORS
PACKING
PERFORMING OPERATIONS
PNEUMATIC TUBE CONVEYORS
PORTABLE POWER-DRIVEN TOOLS
SEMICONDUCTOR DEVICES
SHOP CONVEYOR SYSTEMS
STORING
TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING
TRANSPORTING
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Summary:PROBLEM TO BE SOLVED: To support wafers to eliminate damages and dust deposition. SOLUTION: A hand has a hand part 30 to support a wafer W at part of the outer end and a hand support 40 to mount the hand part thereon. The hand part 30 is formed with two arms 31, 31 having two stepped recesses 32 formed along the outer periphery of the wafer W and a connection plate 35 to connect the arms 31, 31 together. Each stepped recess 32 consists an upper stepped recess with an inclined face and a supporting face and a lower stepped recess to form a space on the lower face side of the wafer W when the wafer W is supported on the upper stepped recess. When the wafer W is supported by the hand 3, the wafer W is supported on the supporting face while being guided along the inclined face of the upper stepped recess.
Bibliography:Application Number: JP19970287116