TREATMENT METHOD OF PHOTOSENSITIVE LITHOGRAPHIC PLATE MATERIAL
PROBLEM TO BE SOLVED: To provide a method capable of carrying out stable treatment without causing a trouble even when treatment of a photosensitive lithographic plate material is carried out while re-desensitizing processing is carried out by an automatic developer having a reentry function. SOLUTI...
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Main Authors | , |
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Format | Patent |
Language | English |
Published |
17.03.1998
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Edition | 6 |
Subjects | |
Online Access | Get full text |
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Summary: | PROBLEM TO BE SOLVED: To provide a method capable of carrying out stable treatment without causing a trouble even when treatment of a photosensitive lithographic plate material is carried out while re-desensitizing processing is carried out by an automatic developer having a reentry function. SOLUTION: At the time of desensitizing processing a photosensitive lithographic plate material again after picture image exposing, developing, cleaning, desensitizing processing, and drying it, it is treated with a desensitizing processing solution at the temperature of 30-70 deg.C and/or desensitizing processing solution containing a surfactant without cleaning process, or the photosensitive lithographic plate material is developed after picture image exposure, cleaned with a washing concentration of a mixed developer of which is less than 3weight%, treated by the desensitizing processing and treated with the desensitizing processing solution without a re-washing processing after drying. |
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Bibliography: | Application Number: JP19960231835 |