TREATMENT METHOD OF PHOTOSENSITIVE LITHOGRAPHIC PLATE MATERIAL

PROBLEM TO BE SOLVED: To provide a method capable of carrying out stable treatment without causing a trouble even when treatment of a photosensitive lithographic plate material is carried out while re-desensitizing processing is carried out by an automatic developer having a reentry function. SOLUTI...

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Bibliographic Details
Main Authors SUGI YASUHISA, HIRAI YOKO
Format Patent
LanguageEnglish
Published 17.03.1998
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
LINING MACHINES
MATERIALS THEREFOR
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PRINTING
PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTINGSURFACES
STAMPS
TRANSPORTING
TYPEWRITERS
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Summary:PROBLEM TO BE SOLVED: To provide a method capable of carrying out stable treatment without causing a trouble even when treatment of a photosensitive lithographic plate material is carried out while re-desensitizing processing is carried out by an automatic developer having a reentry function. SOLUTION: At the time of desensitizing processing a photosensitive lithographic plate material again after picture image exposing, developing, cleaning, desensitizing processing, and drying it, it is treated with a desensitizing processing solution at the temperature of 30-70 deg.C and/or desensitizing processing solution containing a surfactant without cleaning process, or the photosensitive lithographic plate material is developed after picture image exposure, cleaned with a washing concentration of a mixed developer of which is less than 3weight%, treated by the desensitizing processing and treated with the desensitizing processing solution without a re-washing processing after drying.
Bibliography:Application Number: JP19960231835