ANTIREFLECTION FILM AND ITS FILM FORMING METHOD

PROBLEM TO BE SOLVED: To produce an antireflection film having low reflection characteristics with a good productivity at a low cost. SOLUTION: A polarizing functional body 11 as an optical functional material is exposed to an atmosphere of inert gas and oxygen. A single metal selected from silicon,...

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Bibliographic Details
Main Authors KIKUTA YUKIAKI, TAKASU HIDEKI, SHINOHARA HIDEKI
Format Patent
LanguageEnglish
Published 10.03.1998
Edition6
Subjects
ADVERTISING
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
CRYPTOGRAPHY
DIFFUSION TREATMENT OF METALLIC MATERIAL
DISPLAY
DISPLAYING
EDUCATION
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
LABELS OR NAME-PLATES
METALLURGY
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
PHYSICS
SEALS
SIGNS
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Summary:PROBLEM TO BE SOLVED: To produce an antireflection film having low reflection characteristics with a good productivity at a low cost. SOLUTION: A polarizing functional body 11 as an optical functional material is exposed to an atmosphere of inert gas and oxygen. A single metal selected from silicon, titanium, zirconium and aluminum is vaporized by sputtering while an oxygen partial pressure in the atmosphere is controlled. Then, layers having a high refractive index and layers having a low refractive index comprising the oxide of the single metal are alternately deposited to form a multilayered structure on the surface of the optical functional body.
Bibliography:Application Number: JP19960244080