SUBSTRATE RETAINING APPARATUS AND SUBSTRATE TREATMENT APPARATUS USING SUBSTRATE RETAINING APPARATUS

• Main Authors: KOMATSUBARA SHOJI, OKUDA YASUHIKO, SAWADA ATSUSHI
• Format: Patent
• Language: English
• Published: 27.10.1998
• Edition: 6
• Subjects: BASIC ELECTRIC ELEMENTS; CLEANING; CLEANING IN GENERAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; PERFORMING OPERATIONS; PREVENTION OF FOULING IN GENERAL; SEMICONDUCTOR DEVICES; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a substrate retaining apparatus generating less dusts and having a wide allowance for dispersion in substrate supply positions. SOLUTION: Retention rollers 13, 33 is formed of generally double enveloping shape, with a constricted side portion near the center thereof...