BASE PLATE TREATMENT APPARATUS

PROBLEM TO BE SOLVED: To surely seal a treatment chamber for applying treatment to a base plate. SOLUTION: The rotary chuck 20 arranged in a treatment chamber 10 has a base plate holding part 21 and the cylindrical skirt part 27 suspended from the vicinity of the peripheral edge of the under surface...

Full description

Saved in:
Bibliographic Details
Main Author YAMAKOSHI JUNICHI
Format Patent
LanguageEnglish
Published 14.09.1998
Edition6
Subjects
APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL
APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL
BASIC ELECTRIC ELEMENTS
CLEANING
CLEANING IN GENERAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
PERFORMING OPERATIONS
PREVENTION OF FOULING IN GENERAL
SEMICONDUCTOR DEVICES
SPRAYING OR ATOMISING IN GENERAL
TRANSPORTING
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To surely seal a treatment chamber for applying treatment to a base plate. SOLUTION: The rotary chuck 20 arranged in a treatment chamber 10 has a base plate holding part 21 and the cylindrical skirt part 27 suspended from the vicinity of the peripheral edge of the under surface thereof. The lower end of the skirt part 27 comes into contact with the pure water stored in the storage container 40 fixed to the upper surface of a partition wall 15. A central shaft 22 is suspended from the center of the under surface of the base plate holding part 21 to be supported in a freely rotatable manner by a bearing 23. The rotary power from a rotary actuator 16 and the rising and falling drive force from a rising and falling drive mechanism 30 are transmitted to the central shaft 22 by a magnet coupling through the partition wall 15. By this constitution, the rotary chuck 20 is revolved and driven to rise and fall.
Bibliography:Application Number: JP19970051909