CHARGED BEAM LITHOGRAPHY SYSTEM

PROBLEM TO BE SOLVED: To shorten drawing time irrespective of drawing density. SOLUTION: A velocity of an XY stage 16 in an X direction is controlled on the basis of a deviation between the position of a mask 5 or a coordinate position (XY stage coordinate position) of the XY stage 16 and a drawing...

Full description

Saved in:
Bibliographic Details
Main Authors CHOKAI MASAKI, OGAWA YOJI
Format Patent
LanguageEnglish
Published 11.09.1998
Edition6
Subjects
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To shorten drawing time irrespective of drawing density. SOLUTION: A velocity of an XY stage 16 in an X direction is controlled on the basis of a deviation between the position of a mask 5 or a coordinate position (XY stage coordinate position) of the XY stage 16 and a drawing position instructed by drawing pattern data. A beam position control signal is sent to a main deflector 14 to offset a drawing position on the mask 5 oppositely to the movement of the stage of the XY stage 16.
Bibliography:Application Number: JP19970045485