CHARGED BEAM LITHOGRAPHY SYSTEM

PROBLEM TO BE SOLVED: To shorten drawing time irrespective of drawing density. SOLUTION: A velocity of an XY stage 16 in an X direction is controlled on the basis of a deviation between the position of a mask 5 or a coordinate position (XY stage coordinate position) of the XY stage 16 and a drawing...

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Bibliographic Details
Main Authors CHOKAI MASAKI, OGAWA YOJI
Format Patent
LanguageEnglish
Published 11.09.1998
Edition6
Subjects
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Summary:PROBLEM TO BE SOLVED: To shorten drawing time irrespective of drawing density. SOLUTION: A velocity of an XY stage 16 in an X direction is controlled on the basis of a deviation between the position of a mask 5 or a coordinate position (XY stage coordinate position) of the XY stage 16 and a drawing position instructed by drawing pattern data. A beam position control signal is sent to a main deflector 14 to offset a drawing position on the mask 5 oppositely to the movement of the stage of the XY stage 16.
Bibliography:Application Number: JP19970045485