RESIST APPLYING DEVICE

• Main Authors: SHIBA MITSUAKI, IMABAYASHI YOSHITAKA, YANASE HIROYASU, ICHIMURA YUKIO, IKEDA SEIJI
• Format: Patent
• Language: English
• Published: 21.08.1998
• Edition: 6
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a resist applying device which obviates the adhesion of a resist at the front end or rear end or front and rear ends in the transporting direction of a glass substrate. SOLUTION: This device has a resist applying section which has a nip roller 3b rotating while being...