RESIST APPLYING DEVICE

• Main Authors: SHIBA MITSUAKI, IMABAYASHI YOSHITAKA, YANASE HIROYASU, ICHIMURA YUKIO, IKEDA SEIJI
• Format: Patent
• Language: English
• Published: 21.08.1998
• Edition: 6
• Subjects: APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL; APPARATUS SPECIALLY ADAPTED THEREFOR; APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL; CINEMATOGRAPHY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PERFORMING OPERATIONS; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SPRAYING OR ATOMISING IN GENERAL; TRANSPORTING

PROBLEM TO BE SOLVED: To provide a resist applying device which obviates the adhesion of a resist at the front end or rear end or front and rear ends in the transporting direction of a glass substrate. SOLUTION: This device has a resist applying section which has a nip roller 3b rotating while being pressed from above to a rod bar 3a partly submerged at least at its peripheral surface in a resist soln. 3e stored in a receiving tray 3c and rotated and a substrate transporting flat plate 4 which attracts the glass substrate at its rear surface, carries the glass substrate into the resist applying section and ejects the glass substrate coated with the resists at its rear surface. The device has a glass substrate lifting member 5a which forms the regions not coated with the resist of a prescribed width over the entire area in the direction perpendicular to the carrying in or ejecting direction in the front parts or rear parts or front and rear parts at both end edges in the transporting direction of the substrate transporting flat plate 4 or at the front end or rear end of the front and rear end of the glass substrates.