DRILLING METHOD FOR SILICON SINGLE CRYSTAL

PROBLEM TO BE SOLVED: To drill fine holes in a silicon single crystal at a high speed by setting the sending speed within a specified range at a specified frequency and amplitude. SOLUTION: To a rotating diamond core drill 1, a high frequency vibration is given from an oscillator 2 through a horn 3,...

Full description

Saved in:
Bibliographic Details
Main Authors YANAGIMOTO HIDEKI, TAKE YOSHIHIRO, MICHITSU TAKESHI
Format Patent
LanguageEnglish
Published 04.08.1998
Edition6
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:PROBLEM TO BE SOLVED: To drill fine holes in a silicon single crystal at a high speed by setting the sending speed within a specified range at a specified frequency and amplitude. SOLUTION: To a rotating diamond core drill 1, a high frequency vibration is given from an oscillator 2 through a horn 3, and the drill is in contact with a specimen 6 being supported by a support section 4. A high frequency generator 5 is directly connected to the oscillator 2. When the diamond core drill 1 is made to be in contact with the surface of the silicon single crystal specimen 6, the specimen is drilled at a frequence of 60±1kHz, an amplitude of 1-5μm, preferably 1.5-3.0μm by the rotation and vertical vibration of the drill. The silicon single crystal can be drilled at a high sending speed of 2.0-6.0mm/sec.
Bibliography:Application Number: JP19970008413