APPARATUS AND METHOD FOR X-RAY PROJECTION EXPOSURE

PROBLEM TO BE SOLVED: To provide an X-ray projection exposure device by which a desired region can be exposed uniformly without lowering a throughput and to provide an X-ray projection exposure method which uses the exposure device. SOLUTION: An X-ray projection exposure device is constituted so as...

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Bibliographic Details
Main Author OSHINO TETSUYA
Format Patent
LanguageEnglish
Published 21.07.1998
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide an X-ray projection exposure device by which a desired region can be exposed uniformly without lowering a throughput and to provide an X-ray projection exposure method which uses the exposure device. SOLUTION: An X-ray projection exposure device is constituted so as to be provided at least with an X-ray source 1, with an illumination optical system 2 by which a mask 3 having a prescribed pattern is irradiated with X-rays generated from the X-ray source 1, with a projection and image-formation optical system 5 which receives X-rays from the mask 3 and by which the image of the pattern is projected onto a substrate 6 so as to be formed and with scanning and driving systems 4, 7 by which the mask 3 and the substrate 6 are scanned so as to be synchronized. A measuring system 9 which measures the intensity of the X-rays is installed, and control systems 10, 11 which control the scanning speed of the scanning and driving systems 4, 7 according to the measured intensity of the X-rays are installed.
Bibliography:Application Number: JP19960347059