SURFACE MODIFICATION

• Main Authors: SHIMADA MASAYUKI, SHIMAMURA NOBUTAKA, AGARI YASUYUKI, TAKEUCHI HIDEO
• Format: Patent
• Language: English
• Published: 07.07.1998
• Edition: 6
• Subjects: ADHESIVES; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; COMPOSITIONS BASED THEREON; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS; CORRECTING FLUIDS; DYES; FILLING PASTES; GENERAL PROCESSES OF COMPOUNDING; INKS; LAYERED PRODUCTS; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; ORGANIC MACROMOLECULAR COMPOUNDS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; PERFORMING OPERATIONS; POLISHES; THEIR PREPARATION OR CHEMICAL WORKING-UP; TRANSPORTING; USE OF MATERIALS THEREFOR; WOODSTAINS; WORKING-UP

PROBLEM TO BE SOLVED: To obtain a composition that can impart excellent water repulsion, weather resistance, cheminal resistance and antifouling properties to a base material and can manifest good adhesion to the base material, when it is applied to the base material by using a combination of a silicon-containing block copolymer with a polymer that is compatible to the block copolymer and bears polar groups. SOLUTION: This composition comprises (A) a silicon-containing block copolymer [for example, having a polysiloxane segment bearing recurring units of formula I (R is a lower alkyl; R is CN or R ; A1 is an alkylene; Y is O, NH; m>=0) and containing a nonionic monomer units of formula II (R is H, R ; R is R , an alkoloxy-carbonyl; R is H, R ; R is a bond, an alkylene; R is R ), (B) a polymer that is compatible to the component A and bears polar groups [for example, polyvinylphenol or poly(meth)acrylic acid, and when needed, further (C) a salt thereof.