METHOD AND APPARATUS FOR COATING HARD SUBSTRATE

PROBLEM TO BE SOLVED: To prevent the thickness of a drying coating film from changing due to evaporation of a diluting liquid during a coating process and easily alter the coating film thickness by measuring the concentration of a solid matter in a coating liquid and controlling the thickness of the...

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Bibliographic Details
Main Authors EMOTO TATSUYA, YAO YASUYOSHI, NAGAYAMA OSAMU
Format Patent
LanguageEnglish
Published 30.06.1998
Edition6
Subjects
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Summary:PROBLEM TO BE SOLVED: To prevent the thickness of a drying coating film from changing due to evaporation of a diluting liquid during a coating process and easily alter the coating film thickness by measuring the concentration of a solid matter in a coating liquid and controlling the thickness of the drying coating film by controlling the concentration of the solid matter. SOLUTION: When the coating liquid concentration, that is the solid content, is set, a control part 70 sends a coating liquid in a coating liquid tank 38 by a pump 40 to a coating liquid bath 12, monitors the liquid surface level in the coating liquid bath 12 by a liquid surface sensor 26, and stops the supply of the liquid to the supply system 30 at the time when the liquid surface sensor 26 detects the level for dilution. Then, a circulating pump 60 is started to circulate the liquid in the coating liquid bath 12 from a suction aperture 56 through a tube 58 and the concentration of the circulating liquid, that is the solid content in the liquid in the coating liquid bath 12, is detected by a concentration detecting means 62. After that, the control part 70 compares the detected slid content with a set content and supplies the diluting liquid in the case of a thick concentration and a base liquid in the case of a thin concentration.
Bibliography:Application Number: JP19960353894