SINGLE TANK-TYPE CLEANING METHOD AND DEVICE THEREFOR

• Main Authors: TANAKA YUICHIRO, TSUTSUI YOSHITAKA, HIRABAYASHI HISAAKI, KURAHASHI KYOKO, SAITO AKIO, ITO HARUO
• Format: Patent
• Language: English
• Published: 26.06.1998
• Edition: 6
• Subjects: BASIC ELECTRIC ELEMENTS; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; SEMICONDUCTOR DEVICES

PROBLEM TO BE SOLVED: To execute ultrapure water substitution in a short time, by discharging processing liquid, discharging ultrapure water at least once in a cleaning tank, supplying ultrapure water into the cleaning tank, making it overflow from the top of the cleaning tank and substituting ultrapure water for water. SOLUTION: When a substrate 3 is sufficiently immersed in processing liquid, the supply of processing liquid is stopped (supply time is within 15 seconds) and cleaning is executed for several minutes in such a state. A drainage bulb 8 is opened after cleaning, and cleaning processing liquid is discharged at high speed (within seven seconds) from a base part through a drainage piping 7 by a gravity drop. Then, a feed bulb 5 connected to a tank 13 only with ultrapure water is opened after drainage, liquid is supplied at high speed (within 15 seconds) from the base part by ascending flow with the gravity drop. Thus, time for exposing the substrate 3 in the air becomes within 22 seconds and the occurrence of a water mark can be prevented.