X-RAY REFLECTING OPTICAL SYSTEM AND X-RAY PROJECTION ALIGNER EQUIPPED WITH SAID OPTICAL SYSTEM

• Main Author: OSHINO TETSUYA
• Format: Patent
• Language: English
• Published: 04.04.1997
• Edition: 6
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; CINEMATOGRAPHY; ELECTROGRAPHY; GAMMA RAY OR X-RAY MICROSCOPES; HOLOGRAPHY; IRRADIATION DEVICES; MATERIALS THEREFOR; NUCLEAR ENGINEERING; NUCLEAR PHYSICS; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR

PROBLEM TO BE SOLVED: To provide an X-ray reflecting optical system using a multilayer film X-ray reflector where it is easier to form multilayer films and the forming efficiency is high and which facilitates the reduction of the aberration in the optical system and an X-ray projection aligner equipped with the X-ray reflection optical system. SOLUTION: This reflection optical system consists at least of a multilayer film X-ray reflector 1 made of X-ray reflecting multilayer films laminated on a substrate and a reflector holding member to hold the multilayer film X-ray reflector 1. In this case, the reflector holding member is connected to the multilayer X-ray reflector 1 by static electricity and has a holding 2 and a power source component 3. The removal of static electricity cancels the connection of the holder 2, which can be attached or removed freely. The power source 3 generates static electricity by applying voltage between the holder 2 and the multilayer film X-ray reflector 1.