METHOD AND APPARATUS FOR COATING RIGID SUBSTRATE

PROBLEM TO BE SOLVED: To prevent unevenness of coating from being generated by controlling a circulation pump for circulating a coating liq. in one direction being parallel to a microrod bar in a liq. tank on the advancing side of a rigid substrate in a coating liq. tank in an apparatus for coating...

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Bibliographic Details
Main Authors EMOTO TATSUYA, OZAKI MASAFUMI, YAO YASUYOSHI, OTSU MASAO, YAMAZAKI SHINYA
Format Patent
LanguageEnglish
Published 10.02.1997
Edition6
Subjects
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Summary:PROBLEM TO BE SOLVED: To prevent unevenness of coating from being generated by controlling a circulation pump for circulating a coating liq. in one direction being parallel to a microrod bar in a liq. tank on the advancing side of a rigid substrate in a coating liq. tank in an apparatus for coating a coating liq. on the underside of a rigid substrate by carrying the rigid substrate while it is pinched. SOLUTION: A glass substrate is carried under a condition where both left and right edges of the glass substrate are placed on carrying rollers and it is carried at a const. speed after it is placed between a microrod bar 14 and a nip roller and during this time, the underside of the glass substrate is coated with a liq. by means of a microrod bar 14. In this case, a liq. feeding pipe 40 and a suction pipe 42 are provided in a coating liq. tank 12 in such a way that they face each other by placing a coating range between them and each pipe 40 and 42 is connected to an outlet and a suction hole of a circulation pump 44. In addition, the coating liq. is circulated in one direction being parallel to the microrod bar 14 in a liq. tank on the advancing side of the glass substrate and the amt. of discharging of the coating liq. by means of the circulation pump 44 is controlled so as to increase it within a definite period contg. coating.
Bibliography:Application Number: JP19950215522