TRANSDUCER SUPPORTING MECHANISM

PROBLEM TO BE SOLVED: To make the mass production of head supporting mechanisms possible and to improve the cost by etching an Si substrate by crystal anisotropy, thereby forming a slope. SOLUTION: This transducer supporting mechanism consists of the head of a magnetic disk device and a suspension 1...

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Main Authors IMAI SATOMITSU, HARADA TAKESHI, HIGASHIYA TERUYOSHI, HORINO MASAYA, SATOU KAZUYASU, AKASHI TERUHISA, KATO YUKIO, TOKUYAMA MIKIO
Format Patent
LanguageEnglish
Published 07.02.1997
Edition6
Subjects
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
PHYSICS
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Summary:PROBLEM TO BE SOLVED: To make the mass production of head supporting mechanisms possible and to improve the cost by etching an Si substrate by crystal anisotropy, thereby forming a slope. SOLUTION: This transducer supporting mechanism consists of the head of a magnetic disk device and a suspension 1 consisting of Si. The slope 7 is formed on the Si suspension 1 by wet etching utilizing the crystal anisotropy and signal lines 6 are formed by sputtering or vapor deposition, etc., using a shadow mask on the slope 7. As a result, the execution of the electrical connection of the Si suspension 1 and the transducer 3 by batch working is made possible. The mass production of the transducer supporting mechanisms of heads, sensors, etc., and the cost reduction are made possible.
Bibliography:Application Number: JP19950175844