PRELIMINARY ADJUSTMENT PROCESS FOR PROCESSING ACCUMULATION CHAMBER BEFORE ACCUMULATING TUNGSTEN SILICIDE COATING ON ACTIVE SUBSTRATE

• Main Authors: MEI CHIYAN, ARIGA MICHIO, SUUZAN JII TERUFUOODO
• Format: Patent
• Language: English
• Published: 07.10.1997
• Edition: 6
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSESC01D OR C01F; COMPOUNDS THEREOF; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; INORGANIC CHEMISTRY; METALLURGY; NON-METALLIC ELEMENTS; SEMICONDUCTOR DEVICES; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION

PROBLEM TO BE SOLVED: To provide a process for preliminarily adjusting the surface of a tungsten silicide accumulation chamber after cleaning step of a chamber performed in advance and besides before accumulating tungsten silicide on an active substrate within a chamber. SOLUTION: A preliminary adjustment, operation to perform the process of forming a first deposit of tungsten silicide of silane base on the surface of a chamber is performed in the first place by as supply source of gas-form silicon such as silane, etc., or tungsten-containing gas such as WF6 , etc. Preferably, furthermore, as preliminary adjustment process, operation to process the already coated surface of a chamber by the mixture of tungsten-containing gas and chlorine-substituting silane, before tungsten is accumulated on an active substrate within an accumulation chamber, and form chlorine-substituting silane base tungsten silicide on tungsten silicide accumulated in advance is performed.