RESIST DEVELOPING DEVICE

PROBLEM TO BE SOLVED: To provide a resist developing device capable of accurately forming a fine resist pattern and effectively suppressing development defect. SOLUTION: In the resist developing device for developing the resist by discharging a developer from a developing nozzle 36 on a wafer 31, on...

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Bibliographic Details
Main Authors KUSANO YASUSHI, INOUE RITSUKO, HIRANO HARUNOBU, IKEDA RIKIO
Format Patent
LanguageEnglish
Published 19.09.1997
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PROBLEM TO BE SOLVED: To provide a resist developing device capable of accurately forming a fine resist pattern and effectively suppressing development defect. SOLUTION: In the resist developing device for developing the resist by discharging a developer from a developing nozzle 36 on a wafer 31, on which the exposed resist is formed, degassing unit 4 is provided just before at least the tip part of a pipe line 1 for supplying a developer to degas the developer just before discharging. A dissolved gas detecting means can be provided between the tip of the pipe line for supplying the developer and the degassing unit 4. And instead of providing the degassing unit 4, a part just before at least the tip part of the pipe line 1 for supplying the developer can be constituted of a pipe capable of vacuum evacuation, which comprises plural capillary capable of degassing the inside.
Bibliography:Application Number: JP19960083374