PHOTOSENSITIVE RESIN COMPOSITION FOR COATING

• Main Authors: KOSHIMURA KATSUO, YASUDA KENJI
• Format: Patent
• Language: English
• Published: 09.09.1997
• Edition: 6
• Subjects: ADHESIVES; CHEMICAL PAINT OR INK REMOVERS; CHEMISTRY; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS; CORRECTING FLUIDS; DYES; FILLING PASTES; INKS; METALLURGY; MISCELLANEOUS APPLICATIONS OF MATERIALS; MISCELLANEOUS COMPOSITIONS; NATURAL RESINS; PAINTS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; POLISHES; USE OF MATERIALS THEREFOR; WOODSTAINS

PROBLEM TO BE SOLVED: To obtain a photosensitive resin composition for coating, having a small dimensional change of the composition before and after photo-setting, high surface smoothness and dimensional accuracy of a photo-set product and excellent in adhesion to a substrate. SOLUTION: This photosensitive resin composition for coating comprises (1) a particulate copolymer, prepared by copolymerizing a monomer mixture containing (A) 10-95mol% aliphatic conjugated diene monomer, (B) 0.1-10mol% monomer having at least two groups capable of carrying out the addition polymerization and (C) 0.1-70mol% at least another monomer having at least one group capable of conducting the addition polymerization or a photopolymerizable particulate copolymer containing photopolymerizable groups introduced into the particulate copolymer, (2) a photopolymerizable unsaturated monomer and (3) a photopolymerization initiator.