PHOTOSENSITIVE RESIN COMPOSITION FOR COATING

PROBLEM TO BE SOLVED: To obtain a photosensitive resin composition for coating, having a small dimensional change of the composition before and after photo-setting, high surface smoothness and dimensional accuracy of a photo-set product and excellent in adhesion to a substrate. SOLUTION: This photos...

Full description

Saved in:
Bibliographic Details
Main Authors KOSHIMURA KATSUO, YASUDA KENJI
Format Patent
LanguageEnglish
Published 09.09.1997
Edition6
Subjects
ADHESIVES
CHEMICAL PAINT OR INK REMOVERS
CHEMISTRY
COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS
CORRECTING FLUIDS
DYES
FILLING PASTES
INKS
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
PASTES OR SOLIDS FOR COLOURING OR PRINTING
POLISHES
USE OF MATERIALS THEREFOR
WOODSTAINS
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To obtain a photosensitive resin composition for coating, having a small dimensional change of the composition before and after photo-setting, high surface smoothness and dimensional accuracy of a photo-set product and excellent in adhesion to a substrate. SOLUTION: This photosensitive resin composition for coating comprises (1) a particulate copolymer, prepared by copolymerizing a monomer mixture containing (A) 10-95mol% aliphatic conjugated diene monomer, (B) 0.1-10mol% monomer having at least two groups capable of carrying out the addition polymerization and (C) 0.1-70mol% at least another monomer having at least one group capable of conducting the addition polymerization or a photopolymerizable particulate copolymer containing photopolymerizable groups introduced into the particulate copolymer, (2) a photopolymerizable unsaturated monomer and (3) a photopolymerization initiator.
Bibliography:Application Number: JP19960063914