PRODUCTION OF LOWER PERFLUOROALKANE

PROBLEM TO BE SOLVED: To readily produce a lower perfluoroalkane useful as an etching agent for semiconductors, a refrigerat or a forming agent at a relatively low reactional temperature and a low cost. SOLUTION: A perfluoroalkane (e.g. tetrafluoroethlene) is reacted alone pr with carbon dioxide in...

Full description

Saved in:
Bibliographic Details
Main Authors OTSUKA TATSUYA, HIRATA TATSUYA, YAMAGUCHI FUMIHIKO
Format Patent
LanguageEnglish
Published 15.07.1997
Edition6
Subjects
ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS THEREFOR
CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY
CHEMISTRY
GENERAL METHODS OF ORGANIC CHEMISTRY
METALLURGY
ORGANIC CHEMISTRY
PERFORMING OPERATIONS
PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
THEIR RELEVANT APPARATUS
TRANSPORTING
Online AccessGet full text

Cover

More Information
Summary:PROBLEM TO BE SOLVED: To readily produce a lower perfluoroalkane useful as an etching agent for semiconductors, a refrigerat or a forming agent at a relatively low reactional temperature and a low cost. SOLUTION: A perfluoroalkane (e.g. tetrafluoroethlene) is reacted alone pr with carbon dioxide in the presence of an activated carbon catalyst and thermally decomposed, preferably at 500-800 deg.C to afford a lower perfluoroalkane which is the objective compound, e.g. tetrafluoromethane, haxafluoroethane or octafluoropropane. The mixing molar ratio of the perfluoroalkene/carbon dioxide is preferably (1/3)-4. The contact time of the activated carbon catalyst with the raw material gas is preferably 1-60sec.
Bibliography:Application Number: JP19950354119