PROJECTION X-RAY ALIGNER

PROBLEM TO BE SOLVED: To provide a projection X-ray aligner in which aberration is measured and reduced or eliminated to prevent resolution from lowering without a decrease in throughput. SOLUTION: An aberration measuring mechanism 5 is fixed to a wafer stage 12 and is movable with it. To measure ab...

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Bibliographic Details
Main Author OSHINO TETSUYA
Format Patent
LanguageEnglish
Published 10.06.1997
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
GAMMA RAY OR X-RAY MICROSCOPES
HOLOGRAPHY
IRRADIATION DEVICES
MATERIALS THEREFOR
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Summary:PROBLEM TO BE SOLVED: To provide a projection X-ray aligner in which aberration is measured and reduced or eliminated to prevent resolution from lowering without a decrease in throughput. SOLUTION: An aberration measuring mechanism 5 is fixed to a wafer stage 12 and is movable with it. To measure aberration, the wafer stage 12 is slid outside the imaging position of a projection optical imaging system 2, while the aberration measuring mechanism 5 is brought near the imaging position. To measure aberration, an X-ray beam 9' passing through the projection optical imaging system 2 is introduced to the aberration measuring mechanism 5. If an aberration greater than allowable is detected by the aberration measuring mechanism 5, it is reduced or eliminated by an aberration corrective mechanism, which is an optical adjustment mechanism 6 for adjusting the shapes and positions of optical elements of the projection optical system 2.
Bibliography:Application Number: JP19950312277