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PROBLEM TO BE SOLVED: To make it possible to easily remove impurity gas in operating gas by disposing an adsorber for adsorbing the impurity in the gas in the gas channel of an expansion chamber side from a cool storage unit or the expansion chamber. SOLUTION: Operating gas in an expansion chamber 4...

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Bibliographic Details
Main Authors IKUTA YOSHITAKA, TAGUCHI YOSHITO
Format Patent
LanguageEnglish
Published 06.05.1997
Edition6
Subjects
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Summary:PROBLEM TO BE SOLVED: To make it possible to easily remove impurity gas in operating gas by disposing an adsorber for adsorbing the impurity in the gas in the gas channel of an expansion chamber side from a cool storage unit or the expansion chamber. SOLUTION: Operating gas in an expansion chamber 4 is cooled to cryogenic temperature. A molecular sieve 12 is cooled by the gas, and adsorptivity of impurity gas is increased. When the cooled impurity gas is passed through the sieve 12, it is adsorbed in liquid or solid state. Thus, the impurity gas in the operating gas is removed. Helium gas has weak adsorptive power, and even if it is adsorbed to the sieve 12, it is easily substituted for other impurity gas. The impurity gas is captured by the sieve 12 before it is liquefied or solidified, and not almost desorbed.
Bibliography:Application Number: JP19950275973