RADIATION SENSITIVE COMPOSITION

PURPOSE: To suppress a change in sensitivity of a radiation sensitive compsn. with the lapse of time and to make the compsn. excellent in shelf stability by regulating the concn. of halide ions in the compsn. to a specified range. CONSTITUTION: The concn. of halide ions in a negative type radiation...

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Bibliographic Details
Main Authors NAKANO KOJI, OTSUBO YUKI, NISHI MINEO, TAKADA YOSHIHIRO
Format Patent
LanguageEnglish
Published 26.03.1996
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: To suppress a change in sensitivity of a radiation sensitive compsn. with the lapse of time and to make the compsn. excellent in shelf stability by regulating the concn. of halide ions in the compsn. to a specified range. CONSTITUTION: The concn. of halide ions in a negative type radiation sensitive compsn. consisting of an alkali-soluble resin, an optical acid generating agent, a crosslinking agent and a solvent is regulated to <=50ppm. When compds. are used without special consideration, halogen ions are liable to attain to several hundred ppm concn. and this high concn. produces a harmful effect and causes a change of sensitivity with the lapse of time. The concn. of halide ions is preferably made lower but the pref. concn. is <=30ppm, especially <=20ppm. Especially when the leaching of impurities from a glass vessel during storage is considered, the concn. of halide ions is preferably reduced to <=3ppm. The lower limit is >=0.05ppm, usually >=0.1ppm from the viewpoint of the limit of purification.
Bibliography:Application Number: JP19940218476