MASK FOR EXPOSURE OF THIN-FILM MAGNETIC HEAD

PURPOSE: To make it possible to check the focusing of a water so that the dealing with the incidence of the unfeasibility of the restoration of a water can be dealt with before such incidence brakes out at the time of the occurrence of the problem of deviation in focus by the continent trouble of an...

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Bibliographic Details
Main Authors SAWAKE TAKESHI, UCHIUMI KENJI, KAKITA MANABU
Format Patent
LanguageEnglish
Published 24.12.1996
Edition6
Subjects
INFORMATION STORAGE
INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER
PHYSICS
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Summary:PURPOSE: To make it possible to check the focusing of a water so that the dealing with the incidence of the unfeasibility of the restoration of a water can be dealt with before such incidence brakes out at the time of the occurrence of the problem of deviation in focus by the continent trouble of an exposure system by detecting such problem at once. CONSTITUTION: In this mask 20 for exposure of thin-film magnetic heads, patterns for products for integral formation of the many thin-film magnetic heads are longitudinal and transversely regularly arranged and patterns 30 for checking the focus arranged with plural marks of the same shape but different sizes at the four points, upper, lower, left and right of the outer peripheral part of a pattern region 24 for the products are provided. The patterns for checking the focus are preferably set in the sizes of the respective marks so that the next large marks attain the size of the disappearing small-sized marks when the small-sized marks disappear at the time of strong exposure and development.
Bibliography:Application Number: JP19950168368