POSITION DETECTING METHOD

PURPOSE: To enhance the detecting accuracy of a pattern to be an aligning reference by executing a masking on the part of a template image, conducting the masking even on the part corresponding to the masked part, obtaining a correlation value of non-masked areas, and extracting a candidate image as...

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Bibliographic Details
Main Authors KATAMATA YOSHIYUKI, YANAGIHARA MASAMITSU, KOITABASHI HIDEKI
Format Patent
LanguageEnglish
Published 12.07.1996
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: To enhance the detecting accuracy of a pattern to be an aligning reference by executing a masking on the part of a template image, conducting the masking even on the part corresponding to the masked part, obtaining a correlation value of non-masked areas, and extracting a candidate image as a corresponding image. CONSTITUTION: An exposure area is imaged, and the part 45a of a template image 45 previously stored from the imaged image 50 is masked. Simultaneously, the part 53a corresponding to the masked part of the template image of the candidate image 53 listed as the candidate of the extracted corresponding image is also masked. Then, the non-masked area 4b of the image 45 is compared with the non-masked area 53b of the candidate image to obtain correlation value of the non-masked areas, and when the correlation value is a predetermined value or more, the image 53 is extracted as the corresponding image.
Bibliography:Application Number: JP19940321088