PRODUCTION OF THIN FILM AND PRODUCTION OF LIQUID CRYSTAL DISPLAY DEVICE

• Main Author: MIZOUCHI KIYOTSUGU
• Format: Patent
• Language: English
• Published: 07.06.1996
• Edition: 6
• Subjects: BASIC ELECTRIC ELEMENTS; DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; FREQUENCY-CHANGING; NON-LINEAR OPTICS; OPTICAL ANALOGUE/DIGITAL CONVERTERS; OPTICAL LOGIC ELEMENTS; OPTICS; PHYSICS; SEMICONDUCTOR DEVICES; TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF

PURPOSE: To eliminate over- and underetching by using an optical detecting means at the time of wet etching a thin film having a low hydrophobic effect laminated on a thin film having a high hydrophobia effect. CONSTITUTION: The reflected light rays from a substrate 4 are respectively detected by using two light intensity sensors 27, 28 at the time of wet etching the thin film having the low hydrophobic effect. These light intensity sensors 27, 28 are respectively arranged perpendicularly above both extreme ends of the etching liquid supplied from an oscillating etching liquid supply piping 25. The etching is ended at the point of the time the light intensity sensor on one side detects the light intensity at the point of time of the end of the etching and the light intensity sensor on the opposite side continuously detects the light intensity at the point of the time of the end of the etching continuously within the same oscillation period.