METHOD OF DEVELOPING PHOTORESIST

• Main Author: SUGINO MASAMI
• Format: Patent
• Language: English
• Published: 31.05.1996
• Edition: 6
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE: To provide a method of developing a photoresist, by which the resist is removed uniformly inside the face of a semiconductor substrate and in which an irregularity in a worked line width can be reduced. CONSTITUTION: A process in which a photoresist 2 on the surface of a semiconductor subst...