FLOW-RATE COMPENSATING DEVICE OF GAS METER

• Main Authors: UEKI TAKASHI, NEGORO NOBUO, YUMITA YOSHIO, SHIMAKAWA KAZUO, SATOU YASUNOBU, KAMITE MINEYUKI, WATANABE NORIYUKI, HANAKI KATSUHISA, MAEDA KAORU, FUJISAWA KAZUYA, KANEKO ISAO, OTANI TSUTOMU
• Format: Patent
• Language: English
• Published: 31.05.1996
• Edition: 6
• Subjects: MEASURING; MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL; METERING BY VOLUME; PHYSICS; TESTING

PURPOSE: To eliminate the need for a complex mechanical compensation treatment and accurately compensate flow rate even if the operating speed of a mechanical movable part changes within one cycle when the flow rate is constant. CONSTITUTION: A circular plate 51 rotates at a rate in response to gas flow rate, pulses for one rotation of the circulate plate 51 are generated by a waveform-shaping circuit 57, and a pulse with a cycle corresponding to the flow rate is generated by a waveform-shaping circuit 59. A flow-rate compensation device measures the time of one rotation of the circular plate 51 by an operation frequency cycle measurement part 61 and calculates a compensation coefficient corresponding to the time by a compensation coefficient calculation part 63. Also, the cycle of the pulse outputted from the waveform-shaping circuit 59 is measured by a pulse cycle measurement part 64 and the compensated flow rate is calculated based on the pulse cycle measured by the pulse cycle measurement part 64 and a compensation coefficient.