FLOW-RATE COMPENSATING DEVICE OF GAS METER

PURPOSE: To eliminate the need for a complex mechanical compensation treatment and accurately compensate flow rate even if the operating speed of a mechanical movable part changes within one cycle when the flow rate is constant. CONSTITUTION: A circular plate 51 rotates at a rate in response to gas...

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Main Authors UEKI TAKASHI, NEGORO NOBUO, YUMITA YOSHIO, SHIMAKAWA KAZUO, SATOU YASUNOBU, KAMITE MINEYUKI, WATANABE NORIYUKI, HANAKI KATSUHISA, MAEDA KAORU, FUJISAWA KAZUYA, KANEKO ISAO, OTANI TSUTOMU
Format Patent
LanguageEnglish
Published 31.05.1996
Edition6
Subjects
MEASURING
MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL
METERING BY VOLUME
PHYSICS
TESTING
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Summary:PURPOSE: To eliminate the need for a complex mechanical compensation treatment and accurately compensate flow rate even if the operating speed of a mechanical movable part changes within one cycle when the flow rate is constant. CONSTITUTION: A circular plate 51 rotates at a rate in response to gas flow rate, pulses for one rotation of the circulate plate 51 are generated by a waveform-shaping circuit 57, and a pulse with a cycle corresponding to the flow rate is generated by a waveform-shaping circuit 59. A flow-rate compensation device measures the time of one rotation of the circular plate 51 by an operation frequency cycle measurement part 61 and calculates a compensation coefficient corresponding to the time by a compensation coefficient calculation part 63. Also, the cycle of the pulse outputted from the waveform-shaping circuit 59 is measured by a pulse cycle measurement part 64 and the compensated flow rate is calculated based on the pulse cycle measured by the pulse cycle measurement part 64 and a compensation coefficient.
Bibliography:Application Number: JP19940300351