MAGNETORESISTIVE ELEMENT AND MANUFACTURE THEREOF

PURPOSE: To increase an MR ratio, and to enhance magnetic field sensitivity by a method wherein the irregularity of an atomic level is formed on the interface of a magnetic layer and a non-magnetic layer in a magnetoresistive element provided with a magnetic film formed by laminating a magnetic laye...

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Bibliographic Details
Main Authors KUME MINORU, KUROKI KAZUHIKO, TANUMA TOSHIO, MAEDA ATSUSHI
Format Patent
LanguageEnglish
Published 21.05.1996
Edition6
Subjects
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Summary:PURPOSE: To increase an MR ratio, and to enhance magnetic field sensitivity by a method wherein the irregularity of an atomic level is formed on the interface of a magnetic layer and a non-magnetic layer in a magnetoresistive element provided with a magnetic film formed by laminating a magnetic layer and a non-magnetic layer. CONSTITUTION: A Cu layer 2 is formed on a substrate 1 as a non-magnetic material layer, and a Co layer 3 is formed on the Cu layer 2 as a magnetic layer. A GaAs substrate is used as the substrate 1, and a cutting operation is conducted on the surface which is inclined by 2 deg. from a (100) surface. Accordingly, the Cu layer 2, which is the bottom layer, is formed on the surface inclined by 2 deg. from the surface (100). Accordingly, a step-like irregularity of an atomic level is formed based on lattice constant formed on the main surface of the substrate 1, and the Cu layer 2 and the Co layer 3 are laminated on the surface where the above mentioned irregularity is formed. As a result, the Cu layer 2 and the Co layer 3 are formed along irregularity, and the irregularity based on the irregularity on the surface of the substrate 1 is formed on the interface between the Cu layer 2 and and Co layer 3.
Bibliography:Application Number: JP19950159563