EXPOSURE METHOD

PURPOSE: To improve the alignment accuracy significantly in comparison with the conventional method. CONSTITUTION: A correction value is calculated in accordance with a deviation which is obtained by the detection of the relative position relation between a mask 3 and a photosensitive substrate 4. T...

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Bibliographic Details
Main Authors MIYAZAKI SEIJI, YANAGIHARA MASAMITSU, NARA KEI
Format Patent
LanguageEnglish
Published 21.05.1996
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE: To improve the alignment accuracy significantly in comparison with the conventional method. CONSTITUTION: A correction value is calculated in accordance with a deviation which is obtained by the detection of the relative position relation between a mask 3 and a photosensitive substrate 4. The mask 3 and the photosensitive substrate 4 are relatively moved in accordance with the correction value. Then, before the exposure is started, the relative position relation between the mask 3 and the photosensitive substrate 4 after the relative movement is detected again and it is judged whether the difference between the detected result and a predetermined position relation is within an allowable tolerance range or not. If it is not, the above-mentioned procedure is repeated. With this constitution, an error at the time of the relative movement in accordance with the correction value can be controlled, so that a pattern on the mask can be always transferred onto the photosensitive substrate with a high accuracy.
Bibliography:Application Number: JP19940289153