PROJECTION ALIGNER

PURPOSE:To provide a projection aligner for transferring a pattern formed on a mask onto a photosensitive substrate through a projection optical system in which the state of pattern focused on the photosensitive substrate can be corrected through a simple constitution. CONSTITUTION:Exposure can be e...

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Bibliographic Details
Main Authors NAKAMURA OSAMU, YANAGIHARA MASAMITSU, GOTO EIJI
Format Patent
LanguageEnglish
Published 31.03.1995
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To provide a projection aligner for transferring a pattern formed on a mask onto a photosensitive substrate through a projection optical system in which the state of pattern focused on the photosensitive substrate can be corrected through a simple constitution. CONSTITUTION:Exposure can be effected while keeping a good state of mask pattern focused on a photosensitive substrate P by correcting the position of the photosensitive substrate P such that a mask M1 and the photosensitive substrate P are in a conjugate positional relationship.
Bibliography:Application Number: JP19930252528