HDD ALUMINUM BASE POLISHING METHOD

• Main Author: NAGAKURA YUTAKA
• Format: Patent
• Language: English
• Published: 20.03.1995
• Edition: 6
• Subjects: CHEMICAL SURFACE TREATMENT; CHEMISTRY; CLEANING OR DEGREASING OF METALLIC MATERIAL BY CHEMICALMETHODS OTHER THAN ELECTROLYSIS; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS; GRINDING; INFORMATION STORAGE; INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; METALLURGY; PERFORMING OPERATIONS; PHYSICS; POLISHING; TRANSPORTING

PURPOSE:To provide an HOD aluminum base polishing method preventing scratches and reducing a margin to polish plating. CONSTITUTION:Prior to polishing an HDD aluminum base, the aluminum base is submerged in nitric acid of 10-40 deg.C in temperature and 10-30% in concentration and then subjected to caustic washing at the temperature 40-80 deg.C and the concentration 1-l0% to remove an oxidized layer and the like on the surface. Scratches are thereby prevented, and the polishing speed is improved. After this pretreatment, machining is performed using a polishing wheel of high count No. 6000 or more. The roughness of 15nm or less can be thereby obtained, so that sufficient plating profile irregularity can be obtained even if reducing a margin to polish a plating film.