ALIGNER AND ALIGNING METHOD

• Main Authors: UEDA HIROHARU, MAEHARA HIROSHI
• Format: Patent
• Language: English
• Published: 10.03.1995
• Edition: 6
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; MATERIALS THEREFOR; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES

PURPOSE:To provide aligner and aligning method in which the magnification of projection lens can be adjusted by detecting the positional shift of a pattern directly while enhancing the correction accuracy. CONSTITUTION:A first controller 611 measures the relative position between a first substrate side mark formed on a transparent substrate 2 and a first holder side detection mark formed on a holder 13 for a substrate to be exposed based on an output signal from a first CCD camera 521. A second controller 612 measures the relative position between a second substrate side mark and a second holder side mark based on an output signal from a second CCD camera 522. Magnification of a projection lens 32 is calculated based on the relative positions measured by the fist and second controllers 611, 612 which then drive the leans-barrel for adjusting the magnification of the projection lens 32 depending on the calculated magnification of lens thus correcting the magnification of the projection lens 32.