ALIGNER AND ALIGNING METHOD

PURPOSE:To provide aligner and aligning method in which the magnification of projection lens can be adjusted by detecting the positional shift of a pattern directly while enhancing the correction accuracy. CONSTITUTION:A first controller 611 measures the relative position between a first substrate s...

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Bibliographic Details
Main Authors UEDA HIROHARU, MAEHARA HIROSHI
Format Patent
LanguageEnglish
Published 10.03.1995
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To provide aligner and aligning method in which the magnification of projection lens can be adjusted by detecting the positional shift of a pattern directly while enhancing the correction accuracy. CONSTITUTION:A first controller 611 measures the relative position between a first substrate side mark formed on a transparent substrate 2 and a first holder side detection mark formed on a holder 13 for a substrate to be exposed based on an output signal from a first CCD camera 521. A second controller 612 measures the relative position between a second substrate side mark and a second holder side mark based on an output signal from a second CCD camera 522. Magnification of a projection lens 32 is calculated based on the relative positions measured by the fist and second controllers 611, 612 which then drive the leans-barrel for adjusting the magnification of the projection lens 32 depending on the calculated magnification of lens thus correcting the magnification of the projection lens 32.
Bibliography:Application Number: JP19930216082