SURFACE STATE INSPECTION DEVICE AND MANUFACTURE OF SEMICONDUCTOR DEVICE USING THE INSPECTION DEVICE

• Main Authors: TSUJI TOSHIHIKO, SUZUKI MASAYUKI, MIYAZAKI KYOICHI, TAKEUCHI SEIJI
• Format: Patent
• Language: English
• Published: 22.12.1995
• Edition: 6
• Subjects: APPARATUS SPECIALLY ADAPTED THEREFOR; BASIC ELECTRIC ELEMENTS; CINEMATOGRAPHY; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; ELECTROGRAPHY; HOLOGRAPHY; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES; MATERIALS THEREFOR; MEASURING; ORIGINALS THEREFOR; PHOTOGRAPHY; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES; PHYSICS; SEMICONDUCTOR DEVICES; TESTING

PURPOSE:To detect the existence or non-existence of a foreign material on reticule surface at high speed and highly accurately by providing a mirror reciprocating along a sine curve as well as a scanning lens, and scanning inspection surface at non-constant speed using a beam through the scanning lens. CONSTITUTION:A laser beam 1a passes a beam expander 2, thereby expanding the diameter thereof. Then, the beam 1a is incident on the surface 3a of a mirror 3. Thereafter, the beam 1a reflected and deflected with the mirror surface 3a is incident on a scanning lens 4, and emitted under converging action. The beam 1a after the lens 4 is converged on inspection surface 5 and forms a beam spot 6 thereon. The spot 6, then, scans inspection surface 5 on the reciprocating turn of the mirror 3 along a sine curve, and forms a scanning line 7. When a micro foreign substance exists in the spot 6, the beam 1a is scattered isotropically, due to the foreign substance, and the scattered light thereof arrives at an optical detector 10 via a light receiving lens 8 and a field lens 9. The existence of the foreign substance is, then, detected, using an output signal from the detector 10.