SCANNING EXPOSURE DEVICE

PURPOSE:To provide a small scanning exposure device, which has high throughput and in which the quantity of exposure to a photosensitive substrate is equalized even when the quantity of exposure luminous flux changes during exposure. CONSTITUTION:In a scanning exposure device 20, target movement (w)...

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Bibliographic Details
Main Authors SAEKI KAZUAKI, YANAGIHARA MASAMITSU, GOTO EIJI
Format Patent
LanguageEnglish
Published 21.11.1995
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To provide a small scanning exposure device, which has high throughput and in which the quantity of exposure to a photosensitive substrate is equalized even when the quantity of exposure luminous flux changes during exposure. CONSTITUTION:In a scanning exposure device 20, target movement (w) to the exposure luminous flux of a reticle 11 and a glass plate 14 is obtained on the basis of an integrated value detected by a light-quantity integrated-value detecting means 21 detecting the integrated value of the quantity of exposure luminous flux. The movement of the reticle and the glass plate is controlled by a reticle control section 23, a plate control section 24 and a movement control section 25 so that actual movement coincides with the target movement (w).
Bibliography:Application Number: JP19940100377