FINE PATTERN FORMING METHOD

PURPOSE:To easily form desired fine patterns having a desired depth distribution by direct plotting by incorporating a light absorber into a photosensitive material to increase the light absorbance of the photosensitive material, then forming the patterns. CONSTITUTION:The laser beam generated from...

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Bibliographic Details
Main Authors OKADA KATSUYUKI, TODA TOSHITAKA, HONDA TOSHIO, IWATA FUJIRO
Format Patent
LanguageEnglish
Published 21.11.1995
Edition6
Subjects
APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
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Summary:PURPOSE:To easily form desired fine patterns having a desired depth distribution by direct plotting by incorporating a light absorber into a photosensitive material to increase the light absorbance of the photosensitive material, then forming the patterns. CONSTITUTION:The laser beam generated from a laser 1 is made incident on a condenser system 7 via an ND filter 2, a half mirror 3, a mirror 5 and a pinhole 6. The laser beam is made incident from the light condensing system 7 on the photosensitive material (dry plate) 9 consisting of a photoresist placed on an X-Y stage 8 and the fine patterns are formed by direct plotting. The dry plate formed by incorporating the light absorbent into the photoresist at a mixing rate meeting its kind to increase the light absorbance of the photoresist is used as the dry plate 9. Dyestuff, carbon powder or a binder material having the high light absorbance in an exposing wavelength region is preferably used as the light absorber. Ketocumarine dyestuff is more preferable as the dyestuff.
Bibliography:Application Number: JP19940098787