PROCESSING NEUTRAL BEAM GENERATING METHOD

• Main Authors: ONISHI MASARU, HARA TAMIO, HAMAGAKI MANABU, RIYUUJI MAKOTO, AOYANAGI KATSUNOBU, TOKAI MASAKUNI
• Format: Patent
• Language: English
• Published: 20.10.1995
• Edition: 6
• Subjects: BASIC ELECTRIC ELEMENTS; CHEMICAL SURFACE TREATMENT; CHEMISTRY; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; COATING MATERIAL WITH METALLIC MATERIAL; COATING METALLIC MATERIAL; DIFFUSION TREATMENT OF METALLIC MATERIAL; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR; ELECTRICITY; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL; METALLURGY; MICROSTRUCTURAL TECHNOLOGY; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; PERFORMING OPERATIONS; PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTUREOR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS; SEMICONDUCTOR DEVICES; TRANSPORTING

PURPOSE:To neutralize an ion beam and apply the beam to a target sample with good processability by a method wherein an electron beam which is generated in a plasma region and accelerated in an accelerating region is applied to accelerated ions. CONSTITUTION:An ion beam from an ion source 3 is accelerated by accelerating electrodes 7 and 7' and made to enter a neutralizing chamber 6' through through-holes 8 and 8' as the accelerated ion beam 5' which is given a required kinetic energy and made to pass through the neutralizing chamber 6' with a high speed. An electron beam emission apparatus 11 is attached to the neutralization chamber 6' and argon gas from a port 16 is put into a plasma state by a DC power supply 15 and electrons in the plasma are accelerated by a discharge electrode 17' and, further, by a discharge electrode 17'' to form an electron beam 18 having a required high speed. The electron beam 18 is applied to the ion beam 5' in the neutralizing chamber 6' in a direction perpendicular to the ion beam 5'. With this constitution, the ion beam 5' is electrically neutralized and made to pass through a charged particle eliminating filter 23 as a neutral beam 19.